| Device Name | Model | Picture | Main Purpose |
|---|---|---|---|
| Compact Desktop Maskless Laser Direct Writing Lithography System | MicroWriterML3 |
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| Spin Coater, Hot Plate, and Developer System | SPS POLOS |
|
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| Wet Etching and Cleaning Platform | SN-KS200 |
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| Reactive Ion Etching System | SAMCO RIE-200NL |
|
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| Plasma Cleaning System | Nano Low-pressure |
|
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| ASP Series Magnetron Sputtering Coating System | ANSEI TECH |
|
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| Multi-Target Magnetron Sputtering System | HHV-TF600 |
|
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| Plasma-Enhanced Atomic Layer Deposition System | SC6-PEV |
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| Precision Dicing Saw |
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| Multi-functional Ball and Wedge Wire Bonder | MPP |
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| 3D Optical Profiler | BRUKER ContourX-100 |
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| DLP 3D Printer |
B9 Core 550 波长: 405 nm |
|
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| Femtosecond Laser Micro-Nano Processing System |
600 1032nm 180fs 800 KHz |
|
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| Green Continuous Wave Laser Processing System |
Verdi G1 532 nm 10 W |
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| Blue Pulsed Laser |
波长:400~450nm 功率:7W |
|
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| High-precision inkjet printing and hybrid manufacturing platform for flexible circuits and antennas | Self-built system |
|
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| Field Emission Analytical Transmission Electron Microscope | FEI Talos F200X |
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| Scanning Electron Microscope-Focused Ion Beam Dual-Beam System | FEI Helios G4 UC |
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| Objective-Corrected Environmental Transmission Electron Microscope | FEI Themis ETEM |
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| Double Aberration-Corrected Transmission Electron Microscope | FEI Themis Z |
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| Multi-angle Scattering Instrument | Wyatt Dynapro NanoStar |
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| Data Acquisition System | Agilent 34972A |
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| Electrochemical Workstation | CHI660E |
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| Impedance Analyzer | IM3536 |
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| NI Data Acquisition (DAQ) System | cDAQ-9174 |
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| Semiconductor Analyzer | Keithley 4200A-SCS |
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| Vector Network Analyzer | 安立MS46322B |
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| Nonlinear High-Energy Ultrasonic Testing System | RAM-5000 SNAP |
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| Ultrasonic Testing Platform | Vantage 256 |
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| Two-dimensional component two-wave mixing interferometer | Tempo |
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